Nondestructive method of thin film dielectric constant measurements by two-wire capacitor

摘要

We suggest the nondestructive method for determination of the dielectricconstant of substrate-deposited thin films by capacitance measurement with twoparallel wires placed on top of the film. The exact analytical formula for thecapacitance of such system is derived. The functional dependence of thecapacitance on dielectric constants of the film, substrate, and environmentmedia and on the distance between the wires permits to measure the dielectricconstant of thin films for the vast set of parameters where previously proposedapproximate methods are less efficient.